Jeong Jun-jae
Overview
Jeong Jun-jae (鄭準在, born 1965) is a South Korean engineer and educator who has achieved world-class research results in the field of semiconductor and display process technology. He serves as a professor in the Department of Electrical Engineering at Seoul National University, contributing to the development of next-generation semiconductor devices and process technologies. In particular, he holds numerous international journal papers and patents in the fields of extreme ultraviolet (EUV) lithography and thin-film transistors (TFTs). His research has played a crucial role in overcoming the limitations of semiconductor miniaturization processes and driving innovation in the display industry.
Main Content
Education and Early Career
Jeong Jun-jae graduated from the Department of Electrical Engineering at Seoul National University in 1988 and earned a master's degree from the same graduate school in 1990. He later received a Ph.D. in Electrical Engineering from Stanford University in the United States (1995), where his doctoral research on next-generation semiconductor lithography technology garnered attention. After obtaining his Ph.D., he worked as a researcher at IBM T.J. Watson Research Center in the United States from 1996 to 2000, participating in the development of semiconductor process technology.
Academic and Research Activities
Since 2001, he has been a professor in the Department of Electrical and Computer Engineering at Seoul National University, leading the Semiconductor and Display Process Research Laboratory. His main research areas include extreme ultraviolet (EUV) lithography, nanoimprint lithography, thin-film transistor (TFT) manufacturing processes, and organic semiconductor devices. He is particularly recognized as a world authority in the development of photoresist (PR) materials for EUV lithography and process optimization. From the early 2010s, he has also actively participated in research on next-generation display technologies such as micro LED and OLED process technologies.
Jeong has published over 200 papers in international journals and holds more than 50 domestic and international patents. Representative research achievements include the 'development of new photoresists for high-resolution EUV lithography' and 'low-temperature polysilicon (LTPS) TFT process technology for flexible displays.' In 2015, he received the Young Engineer Award from the National Academy of Engineering of Korea for his contributions to the advancement of semiconductor process technology.
Industry-Academia Collaboration and Technology Transfer
Jeong has not remained solely in academia but has actively conducted industry-academia collaboration projects with major domestic semiconductor and display companies such as Samsung Electronics, LG Display, and SK Hynix. In 2018, he successfully transferred his developed EUV lithography photoresist technology to a domestic small and medium-sized enterprise for commercialization, which is considered a case contributing to the localization of semiconductor materials in Korea. Additionally, since 2020, he has served as the general director of the government-led 'Next-Generation Semiconductor Process Technology Development Project,' guiding research directions.
Education and Mentoring
Jeong is also highly regarded as an educator. He teaches courses such as 'Semiconductor Processes,' 'Display Engineering,' and 'Nanodevice Fabrication' at Seoul National University, providing students with practical, hands-on education. Notably, Ph.D. and master's graduates from his laboratory are active as key researchers in domestic and international semiconductor and display companies and research institutes. In 2022, he received the Excellent Professor Award from the Ministry of Education.
Recent Trends
As of 2024, Jeong is focusing on research into next-generation semiconductor process technologies such as 'High-NA EUV lithography' and 'Gate-All-Around (GAA) transistor' processes. In particular, in 2025, his research team's development of a new nanoimprint lithography technology was published in the international journal Nature Nanotechnology, drawing attention. This technology is evaluated as a next-generation patterning technology that can complement the limitations of existing EUV lithography, opening new possibilities for semiconductor miniaturization processes. Additionally, since 2024, he has served as Vice President of the Korean Semiconductor Industry Association, promoting exchanges between academia and industry, and in 2025, he led the publication of the 'Semiconductor Process Technology Roadmap.'
Related Topics
- [[Semiconductor process]]
- [[EUV lithography]]
- [[Display technology]]
- [[Seoul National University Department of Electrical and Computer Engineering]]
- [[Nanoimprint lithography]]
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